S-shaped magnetic macroparticle filter for cathodic arc deposition
نویسندگان
چکیده
منابع مشابه
Bias and Self-Bias of Magnetic Macroparticle Filters for Cathodic Arc Plasmas
Curved magnetic filters are often used for the removal of macroparticles from cathodic arc plasmas. This study addresses the need to further reduce losses and improving plasma throughput. The central figure of merit is the system coefficient, κ , defined as filtered ion current normalized by the plasma-producing arc current. The coefficient κ is investigated as a function of continuous and puls...
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A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon films, where the bias was applied and adjusted when the carbon plasma was condensing and the subs...
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The filtered cathodic vacuum arc technique was employed to deposit magnetic films such as FeNi on silicon substrate. Using the normal cathode design, tetrahedral amorphous carbon and metals films can be deposited. If a magnetic target is used, the arc spot always preferably moves to the edge of the target and then extinguishes. Therefore, the arc is not stable and no film can be deposited. A ca...
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Cathode spot motion influences the physical characteristics of arc plasma and the related macroparticles (MPs) in resultant films; these MPs limit the application of arc ion plating (AIP). In this paper, a scanning radial magnetic field (SRMF) was applied to the cathode surface to control the cathode spot motion and reduce the MP contamination in the deposited films. It was shown that film surf...
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ژورنال
عنوان ژورنال: IEEE Transactions on Plasma Science
سال: 1997
ISSN: 0093-3813
DOI: 10.1109/27.640683